Thick Film Photoresist (I-Line)
Thick film photoresist, it is designed for special MEMS & CSP application. I-line photoresist has good absorption ability to 365nm wavelength.
Production Intro
Use：
- For plating and Sputtering process.
- Dielectric layer, buffer layer and passivation layer for Chip Size Package application.
Spec
- Special designed for each customer.
Product Contact
Li Wei Chen
- TOPCO SCIENTIFIC CO.,LTD.
- Director
- Sales Dept. Ⅱ, Advanced Material Div. II, 1st Business Unit
No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2739
