IC Pellicle
Pellicle is used in IC manufacture process, as a protection of photomasks against dust.
Production Intro
Use：
- To protect photomask against dust.
- Prevent the invasion of foreign objects.
- Maintain light reaction chemically stability.
Spec
- Unit : piece
- Transmission rate : above 99%
- For 6 inch photomask (KrF/ArF application)
Product Contact
Nina Chen
- TOPCO SCIENTIFIC CO.,LTD.
- Dept. Manager
- Sales Dept. Ⅱ, Advanced Material Div. I, 1st Business Unit
No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2725
