KrF Photoresist

KrF Photoresist

DUV KrF photoresist is a key material in lithography process. Pattern on photomask can be transferred to substrate by its photosensitive property.

Production Intro

Product Contact

Li Wei Chen

  • TOPCO SCIENTIFIC CO.,LTD.
  • Director
  • Sales Dept. Ⅱ, Advanced Material Div. II, 1st Business Unit
No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2739